NvisANA
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Founded in 2010, NvisANA has developed a device that enables real-time in-line monitoring of trace amounts of metallic contamination which is optically undetectable on the world's first and only semiconductor wafer.
We will supply equipment that can detect organic matter and ions in the future.
As semiconductor process represented by yield and reliability progressed to design rule shrink of less than 20nm, the contamination that was overlooked in the previous generation devices and began to directly affect device performance production yield and device reliability.
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